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Beilstein J. Nanotechnol. 2016, 7, 1361–1367, doi:10.3762/bjnano.7.127
Figure 1: (a) Scheme of the fabrication process developed in this work to prepare metallic nanowire arrays wi...
Figure 2: AFM images of substrate and the corresponding SEM micrograph after deposition of 220 nm of metal. T...
Figure 3: SEM images after (a,b) 30, (c,d) 220 and (e,f) 360 s of deposition time of copper. (g) Evolution of...
Figure 4: Schematic illustrating the different formation stages of hillocks during the deposition of a metal ...
Figure 5: Influence of the dealloying voltage on the formation of gold–copper with a bubbled morphology. SEM ...
Beilstein J. Nanotechnol. 2012, 3, 846–851, doi:10.3762/bjnano.3.95
Figure 1: Schematics of the carbon-containing nickel nanowire array before (left) and after (right) post-anne...
Figure 2: SEM micrographs of the post-annealed carbon-containing nickel nanowires on silicon nanograted struc...
Figure 3: (a) TEM micrograph of a coaxial nanowire as prepared on a silicon nanograted structure. (b) High-re...
Figure 4: (a) Normalized hysteresis loops of the coaxial nanowire array measured at 300 K with an applied mag...